00 · IN THREE MINUTES

The answer in three steps

  1. 1Early node names tracked a physical dimension more closely than modern labels do.
  2. 2Today “2 nm” identifies a technology family with particular transistor structures, rules and performance targets.
  3. 3Density, power, speed, yield and cost must be compared separately.

01 · ONE NUMBER ONCE TRACKED A FEATURE

One number once tracked a feature

Older generations were often associated with gate length or half-pitch. As transistor geometry became three-dimensional and multiple dimensions limited performance, a single physical measurement stopped representing the whole process.

02 · THE NODE BECAME A PORTFOLIO NAME

The node became a portfolio name

Manufacturers use node labels to distinguish compatible design rules, transistor options, interconnect stacks and fabrication steps. Two companies can use similar names for processes with different densities and characteristics.

FIG. 02How the system changes state
A conceptual mechanism map. Geometry, scale and timing are explanatory unless labelled otherwise.

03 · TRANSISTORS CHANGED SHAPE

Transistors changed shape

FinFETs wrap a gate around a raised fin; gate-all-around devices surround stacked channels more completely. These structures improve electrostatic control without making every relevant dimension equal to the node label.

04 · SCALING HAS SEVERAL SCOREBOARDS

Scaling has several scoreboards

Logic density counts usable cells per area, while performance and power depend on voltage, wiring and design. Memory cells, analog circuits and input/output structures scale at different rates.

05 · MANUFACTURING DECIDES AVAILABILITY

Manufacturing decides availability

A process can demonstrate small features before it achieves high-volume yield. Useful comparisons therefore name the product, date, test conditions and measured metric rather than ranking chips by node label alone.

06 · SOURCES AND EVIDENCE

Sources and evidence

Claims are linked to foundational papers, standards or the primary study behind the update.

  1. 01
    International Roadmap for Devices and Systems

    Supports a defined mechanism, measurement or evidence boundary in this article.

    TECHNICAL STANDARD
  2. 02
    N2 technology

    Supports a defined mechanism, measurement or evidence boundary in this article.

    INSTITUTIONAL REPORT
CHANGE LOG29 Aug 2026 · First five-language edition; mechanisms, limits, diagrams and sources checked.